Nanomaterials (Basel, Switzerland)
Feature Comparison and Process Optimization of Multiple Dry Etching Techniques Applied in Inner Spacer Cavity Formation of GAA NSFET.
Meng Wang, Xinlong Guo, Ziqiang Huang, Meicheng Liao, Tao Liu, Min Xu
Published: 202610.3390/nano16020145
Abstract
The inner spacer module, which profoundly affects the final performance of a device, is a critical component in GAA NSFET (Gate-all-around Nanosheet Field Effect Transistor) manufacturing and necessitates systematic optimization and fundamental innov…
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