Microscopy and microanalysis : the official journal of Microscopy Society of America, Microbeam Analysis Society, Microscopical Society of Canada
Efficient and Robust SEM Image Denoising for Wafer Defect Inspection.
Hyunwoong Bae, Jaeseok Byun, Yongwoo Lee, Taesup Moon
Published: 202510.1093/mam/ozaf084
Abstract
Noise in scanning electron microscopy (SEM) often obscures details critical for accurate wafer defect inspection. Deep learning-based denoising methods have been widely used to address this problem, but they have two major limitations in SEM image de…
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