Tracking oxygen vacancy migration in memristor devices using operando hard X-ray photoelectron spectroscopy.

Fabrication of ultrathin (sub-2 nm) oxide semiconductor memristors poses the fundamental challenge of achieving oxide growth with atomic precision in terms of electronic structure and defect formation. Recently, ultrathin memristors consisting of bilayers of mixed [Formula: see text] [Formula: see text] and MgO atomic layers were fabricated using an in vacuo atomic layer deposition process. This approach offers a unique platform for precise atomic control of oxygen vacancies in the device in which the vacancies are introduced by placing MgO atomic layers between pristine [Formula: see text] [Formula: see text] layers. In this work, we present a systematic operando Hard X-ray PhotoElectron Spectroscopy (HAXPES) study of the switching of such memristors, combined with complementary current-voltage and capacitance-voltage (C-V) measurements. We used a memristor stack of [Formula: see text] [Formula: see text]/MgO atomic layers, with the MgO-containing oxide deposited on the bottom Al metal electrode and a pure [Formula: see text] [Formula: see text] layer below the top Pd electrode. HAXPES analysis shows a substantial change in the chemical shift of the Aluminum oxide when switching between the "OFF" and "ON" states indicative of a redistribution of oxygen vacancies in the device active layer. Interestingly, subsequent switching to the OFF state shows hysteretic behavior indicating the retention of some oxygen vacancies in the top [Formula: see text] [Formula: see text] layer. This vacancy retention can be correlated with the stochastic behavior of the switching voltage observed in these devices. C-V measurements show a clear frequency-dependent response in the OFF state, consistent with enhanced polarization and vacancy trapping at low frequencies.