ACS applied nano materials
Retraction of "N2/H2 Plasma-Enhanced Atomic Layer Deposition for SiO2 Gap Filling: Implications for Nanoelectronics in Semiconductor Manufacturing".
Sameh Okasha, Donald Munson, Jun Yoshikawa
Published: 202610.1021/acsanm.5c05590
Abstract
Open Access[This retracts the article DOI: 10.1021/acsanm.4c06844.].