ACS applied materials & interfaces
Positive Role of Iodine Atoms in Chemically Amplified Photoresists for Extreme Ultraviolet Lithography.
Yejin Ku, Han Bit Park, Gayoung Kim, Hyo-Eun Choi, Jin-Kyun Lee, Jong-Won Lee, Sangsul Lee, Jeongsik Kim, Myounghyun Hur, Jaehyun Kim
Published: 202510.1021/acsami.5c22668
Abstract
In this study, we evaluated the feasibility of incorporating elements with high extreme ultraviolet (EUV) absorption cross sections into chemically amplified photoresist (CAR) formulations to mitigate the sensitivity degradation characteristic of EUV…
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