ACS applied materials & interfaces
Patterning of Mg-Based Oxide Semiconductors (MgZnO) at Sub-100 nm Pitches: Reactive Ion Etching versus Atomic Layer Etching.
Leila Ghorbani, Souvik Kundu, Alexandru Pavel, Shankha Mukherjee, Anastasiia Kruv, Stefan De Gendt, Shreya Kundu
Published: 202510.1021/acsami.5c12715
Abstract
Magnesium-based oxide semiconductors (OSCs) are promising for applications in emerging memory and electronic devices. However, achieving precise and damage-free patterning of Mg-containing materials remains a critical challenge due to their complex e…
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