Small methods
VN Thin Films via MOCVD Using a New Vanadium Precursor: Linking Growth Chemistry to Functional Surface Properties.
Jean-Pierre Glauber, Julian Lorenz, Ji Liu, Marietta Seifert, Volker Hoffmann, Carlos Abad, Detlef Rogalla, Lars Giebeler, Corinna Harms, Michael Wark, Michael Nolan, Anjana Devi
Published: 202510.1002/smtd.202501972
Abstract
Vanadium nitride (VN) is a promising material for many applications, including the electrochemical nitrogen reduction reaction (eNRR). Catalyst nanoengineering enables experimental validation of its predicted eNRR activity, but most VN catalysts are…
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