Advanced science (Weinheim, Baden-Wurttemberg, Germany)
Water-Assisted Exfoliation of HfO2-Based Membrane for Flexible Robust Ferroelectric Synaptic Transistors.
Han Zhang, Miao Zeng, Jingxin Chen, Lei Wang, Sai Jiang, Qian Cao, Xuebo Li, Zekun Hou, Chun Shen, Yulin Gan, Ning Fang, Zhaoliang Liao, Ziyao Zhou, Lin Hao
Published: 202610.1002/advs.202523654
Abstract
HfO2-based thin films possess broad application potential in semiconductors, non-volatile memory, and neuromorphic computing owing to their high dielectric constant, excellent ferroelectricity, and environmental robustness. However, an environmentall…
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