Advanced science (Weinheim, Baden-Wurttemberg, Germany)
Accelerated Discovery of Topological Conductors for Nanoscale Interconnects.
Alexander C Tyner, William Rogers, Po-Hsin Shih, Yi-Hsin Tu, Gengchiau Liang, Hsin Lin, Ching-Tzu Chen, James M Rondinelli
Published: 202610.1002/advs.202520535
Abstract
The sharp increase in resistivity of copper interconnects at ultra-scaled dimensions threatens the continued miniaturization of integrated circuits. Topological semimetals (TSMs) with gapless surface states (Fermi arcs) provide conduction channels re…
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